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Analysis of microelectronic materials and devices.
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Angewandte Oberflächenanalyse : mit SIMS Sekundär-Ionen-Massenspektrometrie, AES Auger-Elektronen-Spektrometrie, XPS Röntgen-Photoelektronen-Spektrometrie : 20 Tabellen /
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Progress in materials analysis. volume 1 : Metallurgical analysis : colloquium. 11 : Wien, 03.11.1982-05.11.1982.
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Metallkundliche Analyse : Kolloquium. 10 : Wien, 03.11.1980-05.11.1980.
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Metallkundliche Analyse : Kolloquium. 9 : Wien, 12.10.1978-25.10.1978.
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