Plasma etching in semiconductor fabrication.
Saved in:
Personal Name(s): | Morgan, R. A. |
---|---|
Imprint: |
Amsterdam :
Elsevier,
1985.
|
Physical Description: |
X, 316 S. |
Note: |
englisch |
ISBN: |
0444424695 9780444424198 9780444424693 0444424199 |
Series Title: |
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"name" and "number" keys or a flat string containing only the series
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Plasma technology ;
0001. |
Subject (ZB): | |
Classification: | |
Shelf Classification: |
LEADER | 00821nam a2200265 n 4500 | ||
---|---|---|---|
001 | 115278 | ||
005 | 19970518000000.0 | ||
008 | r1985 | ||
020 | |a 0444424199 | ||
020 | |a 0444424695 | ||
035 | |a (Sirsi) a102802 | ||
084 | 0 | |a FGKJ - Plasma processing, etching |2 ZB | |
084 | 1 | |a FGK - Dünnfilmtechnologie, Epitaxie |2 LS | |
245 | 0 | 0 | |a Plasma etching in semiconductor fabrication. |
260 | |a Amsterdam : |b Elsevier, |c 1985. | ||
300 | |a X, 316 S. | ||
490 | 0 | |a Plasma technology ; |v 0001. | |
500 | |a englisch | ||
596 | |a 1 | ||
650 | 4 | |a plasma etching | |
700 | 1 | |a Morgan, R. A. | |
900 | |a S 005891-0001'01' | ||
900 | |a FGK 101 | ||
908 | |a Monographie, Sammelwerk | ||
949 | |a FGK 101 |w LC |c 1 |i 1086003740 |d 4/11/2011 |e 28/10/2011 |l STACKS |m ZB |n 6 |r Y |s Y |t ZBB |u 25/3/2009 |x ZB-F |1 PRINT |