Contemporary preparative techniques.
Saved in:
Personal Name(s): | Francombe, M. H., editor |
---|---|
Imprint: |
Boston, MA :
Academic Pr.,
1989.
|
Physical Description: |
X, 259 S. |
Note: |
englisch |
ISBN: |
0125330146 9780125330145 |
Series Title: |
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"name" and "number" keys or a flat string containing only the series
name. We should account for both cases to maximize compatibility. */?>
Physics of thin films ;
14. |
Keywords: |
reactive sputtering plasma oxidation cathodic arc plasma deposition of thin films preparation of substrates for film deposition using glow discharge techniques |
Subject (ZB): | |
Classification: | |
Shelf Classification: |
LEADER | 01177cam a2200325 n 4500 | ||
---|---|---|---|
001 | 120530 | ||
005 | 19971208000000.0 | ||
008 | r1989 | ||
020 | |a 0125330146 | ||
035 | |a (Sirsi) a107159 | ||
084 | 0 | |a FFP - Physics of thin films |2 ZB | |
084 | 0 | |a FGK - Thin film technology, epitaxy |2 ZB | |
084 | 1 | |a FFP - Physik dünner Filme |2 LS | |
245 | 0 | 0 | |a Contemporary preparative techniques. |
260 | |a Boston, MA : |b Academic Pr., |c 1989. | ||
300 | |a X, 259 S. | ||
490 | 0 | |a Physics of thin films ; |v 14. | |
500 | |a englisch | ||
596 | |a 1 | ||
650 | 4 | |a thin film physics | |
653 | |a reactive sputtering | ||
653 | |a plasma oxidation | ||
653 | |a cathodic arc plasma deposition of thin films | ||
653 | |a preparation of substrates for film deposition using glow discharge techniques | ||
700 | 1 | |a Francombe, M. H., |e Hrsg. | |
900 | |a S 000482-0014'01' | ||
900 | |a FFP 001-14 | ||
908 | |a Monographie, Sammelwerk | ||
949 | |a FFP 001-14 |w LC |c 1 |i 1089103791 |d 30/5/2000 |e 29/3/2000 |l STACKS |m ZB |n 1 |r Y |s Y |t ZBB |u 25/3/2009 |x ZB-F |1 PRINT | ||
949 | |a S 000482-0014'01' |w LC |c 1 |i 1089104389 |l STACKS |m ZB |r Y |s Y |t ZBB |u 25/3/2009 |x ZB-F |1 PRINT |