The silicon / SiO2 system.
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| Personal Name(s): | Balk, P., (editor) |
|---|---|
| Imprint: |
Amsterdam :
Elsevier,
1988.
|
| Physical Description: |
IX, 356 S. |
| Note: |
englisch |
| ISBN: |
9780444426031 0444426035 |
| Series Title: |
Materials science monographs ;
vol 0032. |
| Keywords: |
technology and kinetics of SiO2 growth physical structure and chemical nature of the silicon/SiO2 interfacial region the oxidation process and silicon/SiO2 system properties charge trapping in SiO2 and the silicon/SiO2 interface electrical evaluation of the silicon/SiO2 system |
| Classification: | |
| Shelf Classification: |
Call Number: S 004259-0032'01' Barcode: 1089101387
