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The silicon / SiO2 system.

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Personal Name(s): Balk, P., editor
Imprint: Amsterdam : Elsevier, 1988.
Physical Description: IX, 356 S.
Note: englisch
ISBN: 9780444426031
0444426035
Series Title: Materials science monographs ; vol 0032.
Keywords: technology and kinetics of SiO2 growth
physical structure and chemical nature of the silicon/SiO2 interfacial region
the oxidation process and silicon/SiO2 system properties
charge trapping in SiO2 and the silicon/SiO2 interface
electrical evaluation of the silicon/SiO2 system
Classification:
FFPE - Thin film electronic properties, semiconductor interfaces
Shelf Classification:
FFP - Physik dünner Filme
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IBN-1-2
Institute Call Number: S 004259-0032'01' Barcode: 1089101387 Available   
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Reading Room Call Number: FFP 061 Barcode: 1088103661 Available   

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