Diffusion barriers in semiconductor contact metallization.
silicon metallization by tungsten, titanium mitride
Saved in:
| Personal Name(s): | Kattelus, H. |
|---|---|
| Imprint: |
Helsinki :
Teknillinen Korkeakoulu.
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| Physical Description: |
GETR. PAG. |
| Note: |
englisch |
| Series Title: |
Technical Research Centre of Finland publications ;
vol 0048. |
| Classification: |
| ZB | |
|---|---|
Open Stacks  Call number: S 005036-0048'01' Barcode: 1088200321
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