Advanced CMOS process technology.
Advanced CMOS process technology :
Saved in:
Personal Name(s): | Pimbley, J. M., Mitarb. |
---|---|
Imprint: |
San-Diego, CA :
Academic Pr.,
1989.
|
Physical Description: |
VIII, 296 S. |
Note: |
englisch |
ISBN: |
9780122341199 0122341198 |
Series Title: |
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VLSI electronics microstructure science ;
19. |
Classification: | |
Shelf Classification: |
LEADER | 01061cam a2200325 n 4500 | ||
---|---|---|---|
001 | 127951 | ||
005 | 19990427143500.0 | ||
008 | r1989 | ||
020 | |a 0122341198 | ||
035 | |a (Sirsi) a113726 | ||
084 | 0 | |a FGM - Microelectronic technology |2 ZB | |
084 | 0 | |a FGMH - Metallization, physics of microelectronics |2 ZB | |
084 | 1 | |a FGM - Mikroelektronik - Technologie |2 LS | |
245 | 0 | 0 | |a Advanced CMOS process technology. |
260 | |a San-Diego, CA : |b Academic Pr., |c 1989. | ||
300 | |a VIII, 296 S. | ||
490 | 0 | |a VLSI electronics microstructure science ; |v 19. | |
500 | |a englisch | ||
520 | |a Advanced CMOS process technology : | ||
520 | |a CMOS device and circuit background | ||
520 | |a metallization | ||
520 | |a isolation techniques | ||
520 | |a reliability | ||
520 | |a yield | ||
596 | |a 1 | ||
700 | 1 | |a Pimbley, J. M., |e Mitarb. | |
900 | |a B 054847'01'-019 | ||
900 | |a FGM 019-19 | ||
908 | |a Monographie, Sammelwerk | ||
949 | |a FGM 019-19 |w LC |c 1 |i 1089103969 |l STACKS |m ZB |r Y |s Y |t ZBB |u 25/3/2009 |x ZB-F |1 PRINT |