Surface modification engineering vol 0001: fundamental aspects.
Saved in:
Personal Name(s): | Kossowsky, R., editor |
---|---|
Imprint: |
Boca-Raton, FL :
CRC Pr.,
1989.
|
Physical Description: |
334 S. |
Note: |
englisch |
ISBN: |
0849347696 9780849347696 |
Series Title: |
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Surface modification engineering ;
vol 0001. |
Keywords: |
technological surfaces properties of technological surfaces characterization of technological surfaces interactions of surfaces with environment aqueous corrosion biological interfacial phenomena friction and wear surface modification methods chemical vapor deposition (CVD) physical vapor deposition: evaporation, sputter deposition, ion plating (plasma assisted CVD) ion implantation and ion beam mixing modification of polymer surfaces |
Subject (ZB): | |
Classification: | |
Shelf Classification: |
LEADER | 01712nam a2200481 n 4500 | ||
---|---|---|---|
001 | 133281 | ||
005 | 19970519000000.0 | ||
008 | r1989 | ||
020 | |a 0849347696 | ||
035 | |a (Sirsi) a118415 | ||
084 | 0 | |a FPUJ - Surface engineering |2 ZB | |
084 | 0 | |a FGK - Thin film technology, epitaxy |2 ZB | |
084 | 1 | |a FPU - Korrosionsschutz, Oberflächenbeschichtung |2 LS | |
245 | 0 | 0 | |a Surface modification engineering vol 0001: fundamental aspects. |
260 | |a Boca-Raton, FL : |b CRC Pr., |c 1989. | ||
300 | |a 334 S. | ||
490 | 0 | |a Surface modification engineering ; |v vol 0001. | |
500 | |a englisch | ||
596 | |a 1 | ||
650 | 4 | |a surface modification | |
650 | 4 | |a thin film technology | |
650 | 4 | |a corrosion | |
650 | 4 | |a chemical vapor deposition | |
650 | 4 | |a evaporation | |
650 | 4 | |a sputtering | |
650 | 4 | |a ion implantation | |
653 | |a technological surfaces | ||
653 | |a properties of technological surfaces | ||
653 | |a characterization of technological surfaces | ||
653 | |a interactions of surfaces with environment | ||
653 | |a aqueous corrosion | ||
653 | |a biological interfacial phenomena | ||
653 | |a friction and wear | ||
653 | |a surface modification methods | ||
653 | |a chemical vapor deposition (CVD) | ||
653 | |a physical vapor deposition: evaporation, sputter deposition, ion plating (plasma assisted CVD) | ||
653 | |a ion implantation and ion beam mixing | ||
653 | |a modification of polymer surfaces | ||
700 | 1 | |a Kossowsky, R., |e Hrsg. | |
900 | |a B 069383'01'-001 | ||
900 | |a FPU 027-01 | ||
908 | |a Monographie, Sammelwerk | ||
949 | |a FPU 027-01 |w LC |c 1 |i 1091105721 |l STACKS |m ZB |r Y |s Y |t ZBB |u 25/3/2009 |x ZB-F |1 PRINT |