VLSI technology / edited by S.M. Sze.

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Sze, S. M.
2nd ed.
New York, NY : McGraw-Hill, 1988.
XII, 676 p.
englisch
0070627355
9780070627352
MacGraw-Hill series in electrical engineering. Electronics and electronic circuits.
crystal growth and wafer preparation
epitaxy (for VLSI technology)
oxidation (in VLSI technology)
lithography
reactive plasma etching
dielectric and polysilicon film deposition
diffusion in solids and semiconductors
ion implantation (for VLSI technology)
metallization
VLSI process simulation
vlsi process integration
analytical techniques (in VLSI technology)
assembly techniques and packaging of VLSI devices
yield and reliability (in VLSI technology)
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490 0 |a MacGraw-Hill series in electrical engineering. Electronics and electronic circuits. 
500 |a englisch 
596 |a 1 10 26 
650 4 |a VLSI technology 
650 4 |a microelectronics 
653 |a crystal growth and wafer preparation 
653 |a epitaxy (for VLSI technology) 
653 |a oxidation (in VLSI technology) 
653 |a lithography 
653 |a reactive plasma etching 
653 |a dielectric and polysilicon film deposition 
653 |a diffusion in solids and semiconductors 
653 |a ion implantation (for VLSI technology) 
653 |a metallization 
653 |a VLSI process simulation 
653 |a vlsi process integration 
653 |a analytical techniques (in VLSI technology) 
653 |a assembly techniques and packaging of VLSI devices 
653 |a yield and reliability (in VLSI technology) 
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