Plasma sources for thin film deposition and etching.
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Personal Name(s): | Francombe, M. H., editor |
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Imprint: |
San-Diego, CA :
Academic Pr.,
1994.
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Physical Description: |
XII, 328 S. |
Note: |
englisch |
ISBN: |
9780125330183 0125330189 |
Series Title: |
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Physics of thin films ;
18. |
Keywords: |
design of high density plasma sources for materials processing electron cyclotron resonance (ECR) plasma sources and their use in plasma assisted chemical vapor deposition of thin films unbalanced magnetron sputtering the formation of particles in thin film processing plasmas |
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Classification: | |
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Reading Room Call number: FFP 001-18 Barcode: 1094103512 Available |