X-ray diffraction at elevated temperatures : a method for in situ process analysis / D.D.L. Chung ... [et al.]
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Personal Name(s): | Chung, Deborah D. L. |
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Imprint: |
New York :
VCH,
1993.
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Physical Description: |
viii, 268 p. |
Note: |
englisch |
ISBN: |
9780895737458 0895737450 9783527278428 3527278427 |
Keywords: |
review of x-ray diffraction x-ray diffraction at elevated temperatures using intense x-ray sources x-ray diffraction at elevated temperatures using position sensitive detectors instrumentation of x-ray diffraction at elevated temperatures in situ process analysis at elevated temperatures applications of x-ray diffraction at elevated temperatures kinetic study using x-ray diffraction at elevated temperatures |
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ZB | |
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Reading Room Call number: FCA 013 Barcode: 1094101979 Available |