Tantalum thin films / W. D. Westwood, N. Waterhouse, and P. S. Wilcox.
Tantalum thin film technology: application to passive circuit elements of hydrid microcircuits :
Saved in:
Personal Name(s): | Westwood, William D. |
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Waterhouse, N. / Wilcox, P. S. | |
Imprint: |
London, New York :
Academic Press,
1975.
|
Physical Description: |
xiii, 436 p. |
Note: |
englisch |
ISBN: |
9780127447506 0127447504 |
Classification: | |
Shelf Classification: |
LEADER | 01454nam a2200373 n 4500 | ||
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001 | 9302 | ||
005 | 19970314000000.0 | ||
008 | r1975 | ||
020 | |a 0127447504 | ||
035 | |a (Sirsi) a18273 | ||
084 | 0 | |a FFPE - Thin film electronic properties, semiconductor interfaces |2 ZB | |
084 | 0 | |a FGM - Microelectronic technology |2 ZB | |
084 | 0 | |a FGK - Thin film technology, epitaxy |2 ZB | |
084 | 1 | |a FFP - Physik dünner Filme |2 LS | |
245 | 0 | 0 | |a Tantalum thin films / |c W. D. Westwood, N. Waterhouse, and P. S. Wilcox. |
260 | |a London, |a New York : |b Academic Press, |c 1975. | ||
300 | |a xiii, 436 p. | ||
500 | |a englisch | ||
520 | |a Tantalum thin film technology: application to passive circuit elements of hydrid microcircuits : | ||
520 | |a evaporated tantalum films | ||
520 | |a tantalum films sputtered without doping | ||
520 | |a tantalum films sputtered with doping | ||
520 | |a conduction mechanisms in tantalum films | ||
520 | |a aging and stability of tantalum films | ||
520 | |a dielectric tantalum oxide films | ||
520 | |a tantalum films: device processing and applications | ||
596 | |a 1 | ||
700 | 1 | |a Westwood, William D. | |
700 | 1 | |a Waterhouse, N. | |
700 | 1 | |a Wilcox, P. S. | |
900 | |a B 041809'01' | ||
900 | |a FFP 063 | ||
908 | |a Monographie, Sammelwerk | ||
949 | |a FFP 063 |w LC |c 1 |i 1075007291 |d 4/8/2010 |e 6/7/2010 |l STACKS |m ZB |n 5 |r Y |s Y |t ZBB |u 25/3/2009 |x ZB-F |1 PRINT |o .CIRCNOTE. |