Allotaxie: ein neues Verfahren zur Herstellung von Eisendisilizid- und Siliziumdioxid-Heterostrukturen in Silizium [E-Book] / Ottmar Skeide
(buried layers of fesi2 and sio2 in silicon)
Saved in:
Full text JuSER |
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Personal Name(s): | Skeide, Ottmar, author |
Imprint: |
Jülich :
Forschungszentrum, Zentralbibliothek,
1994
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Physical Description: |
1 Online-Ressource (101 Seiten) |
Note: |
deutsch |
Series Title: |
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Berichte des Forschungszentrums Jülich ;
2869 |
Dissertation Note: |
Zugleich: Dissertation, Universität Köln
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Subject (ZB): | |
Classification: |
(buried layers of fesi2 and sio2 in silicon) Allotaxy: a novel process for fabrication of iron disilicide and silicon dioxide heterostructures in silicon |