Amorphisierung und Spannungsabbau in Silizidfilmen unter Ionenbeschuß [E-Book] / Christoph Hardtke
amorphization and stress relaxation in silicide films (tasi2, mosi2) under ion bombardment
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Full text JuSER |
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Personal Name(s): | Hardtke, Christoph, author |
Imprint: |
Jülich :
Forschungszentrum, Zentralbibliothek,
1992
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Physical Description: |
1 Online-Ressource (119 Seiten) |
Note: |
deutsch |
Series Title: |
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Berichte des Forschungszentrums Jülich ;
2575 |
Dissertation Note: |
Zugleich: Dissertation, Rheinisch-Westfälische Technische Hochschule Aachen
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Subject (ZB): | |
Classification: |
amorphization and stress relaxation in silicide films (tasi2, mosi2) under ion bombardment |