Advances in CMP/polishing technologies for the manufacture of electronic devices [E-Book] / edited by Toshiro Doi, Ioan D. Marinescu, Syuhei Kurokawa.
Doi, Toshiro.
Marinescu, Ioan D. / Kurokawa, Syuhei.
1st ed.
Oxford : William Andrew, 2012
1 online resource (xii, 317 p.)
englisch
9781437778595
1437778593
Full Text
CMP and polishing are the most precise processes used to finish the surfaces of mechanical and electronic or semiconductor components. This title presents the developments and technological innovations in the field - making R&D accessible to the wider engineering community.