Atomic layer deposition for semiconductors [E-Book] / ed.: Cheol Seong Hwang ...
Atomic Layer Deposition (ALD) was originally designed for depositing uniform passivation layers over a very large area for display devices in the late 1970s. Only recently, in the 21st century, has the this technique become popular for high integrated semiconductor memory devices. This book discuss...
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Full text |
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Personal Name(s): | Seong Hwang, Cheol |
Imprint: |
Boston, MA :
Springer,
2014
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Physical Description: |
X, 263 p. 170 illus., 81 illus. in color online resource |
Note: |
englisch |
ISBN: |
9781461480549 |
DOI: |
10.1007/978-1-4614-8054-9 |
Subject (ZB): | |
Subject (LOC): | |
Classification: |
- Introduction
- Precursors and reaction mechanisms
- ALD simulations
- ALD for mass-production memories (DRAM and Flash)
- ALD for emerging memories
- PcRAM
- FeRAM
- Front end of the line process
- Back end of the line
- ALD machines