Characterization, integration and reliability of HfO2 and LaLuO3 high-k/metal gate stacks for CMOS applications [E-Book] / Alexander Nichau
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Full text JuSER |
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Personal Name(s): | Nichau, Alexander, author |
Imprint: |
Jülich :
Forschungszentrum, Zentralbibliothek,
2013
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Physical Description: |
1 Online-Ressource |
Note: |
englisch |
ISBN: |
9783893368983 |
Series Title: |
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Schriften des Forschungszentrums Jülich. Reihe Information / information ;
28 |
Dissertation Note: |
Zugleich: Dissertation, Rheinisch-Westfälische Technische Hochschule Aachen, 2013
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Subject (ZB): | |
Classification: |
Description not available. |