Implantation of boron in silicon.
Saved in:
Personal Name(s): | Hofker, W. K. |
---|---|
Imprint: |
Eindhoven :
Philips,
1975.
|
Physical Description: |
121 S. |
Note: |
englisch |
Keywords: |
ion implantation : b boron implantation : si |
Classification: |
LEADER | 00803cas a2200241 n 4500 | ||
---|---|---|---|
001 | 163841 | ||
005 | 20010111113000.0 | ||
008 | r1975 | ||
035 | |a (Sirsi) a4694 | ||
084 | 0 | |a FGGB - Ion implantation, ion beam synthesis |2 ZB | |
084 | 0 | |a FJKB - Elemental semiconductors |2 ZB | |
245 | 0 | 0 | |a Implantation of boron in silicon. |
260 | |a Eindhoven : |b Philips, |c 1975. | ||
300 | |a 121 S. | ||
500 | |a englisch | ||
596 | |a 1 | ||
653 | |a ion implantation : b | ||
653 | |a boron implantation : si | ||
700 | 1 | |a Hofker, W. K. | |
710 | 2 | |a Philips' Gloeilampenfabrieken (Eindhoven) |b Natuurkundig Laboratorium. | |
900 | |a Z 000515-1975,S008 | ||
908 | |a Hochschulschrift | ||
949 | |a Z 000515-1975,S008 |w LC |c 1 |i 9900003926 |l STACKS |m ZB |r Y |s Y |t ZBHS |u 25/3/2009 |x ZB-F |1 PRINT |2 HS |