Investigation on SiGe Selective Epitaxy for Source and Drain Engineering in 22 nm CMOS Technology Node and Beyond [E-Book] / by Guilei Wang.
Wang, Guilei, (author)
1st edition 2019.
Singapore : Springer, 2019
XVI, 115 pages (online resource)
englisch
9789811500466
10.1007/978-981-15-0046-6
Springer Theses, Recognizing Outstanding Ph.D. Research
Full Text
Table of Contents:
  • Introduction
  • Strain technology of Si-based materials
  • SiGe Epitaxial Growth and material characterization
  • SiGe Source and Drain Integration and transistor performance investigation
  • Pattern Dependency behavior of SiGe Selective Epitaxy
  • Summary and final words.