Plasma processing for VLSI.
Saved in:
Personal Name(s): | Einspruch, N. G., editor |
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Imprint: |
Orlando, FL :
Academic Pr.,
1984.
|
Physical Description: |
XIV, 527 S. |
Note: |
englisch |
ISBN: |
0122341082 9780122341083 |
Series Title: |
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VLSI electronics microstructure science ;
8. |
Keywords: |
VLSI : ion etching |
Classification: | |
Shelf Classification: |