Reiner, M., Aslam, N., Hoffmann-Eifert, S., & Waser, R. (2012). Atomic layer deposition of TiO2-x thin films for resistive switching devices.
Chicago Style CitationReiner, M., N. Aslam, S. Hoffmann-Eifert, andfavorite R. Waser. Atomic Layer Deposition of TiO2-x Thin Films for Resistive Switching Devices. 2012.
MLA CitationReiner, M., N. Aslam, S. Hoffmann-Eifert, andfavorite R. Waser. Atomic Layer Deposition of TiO2-x Thin Films for Resistive Switching Devices. 2012.
Warning: These citations may not always be 100% accurate.