This title appears in the Scientific Report :
2012
Atomic layer deposition of TiO2-x thin films for resistive switching devices
Atomic layer deposition of TiO2-x thin films for resistive switching devices
Saved in:
Personal Name(s): | Reiner, M. |
---|---|
Aslam, N. / Hoffmann-Eifert, S. / Waser, R. | |
Contributing Institute: |
JARA-FIT; JARA-FIT Elektronische Materialien; PGI-7 |
Published in: |
ENHANCE-MC-ITN Winterschool |
Imprint: |
2012
|
Conference: | Helsinki, Finland 2012-01-09 |
Document Type: |
Poster |
Research Program: |
Grundlagen für zukünftige Informationstechnologien |
Publikationsportal JuSER |
Description not available. |