This title appears in the Scientific Report :
2009
Thermal Stability of Sub-Stoichioimetric Amorphous Silicon Oxide Layers for Crystalline Silicon Surface Passivation
Thermal Stability of Sub-Stoichioimetric Amorphous Silicon Oxide Layers for Crystalline Silicon Surface Passivation
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Personal Name(s): | Einsele, F. |
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Beyer, W. / Rau, U. | |
Contributing Institute: |
Photovoltaik; IEF-5 |
Published in: |
24th European Photovoltaic Solar Energy Conference |
Imprint: |
2009
|
Conference: | Hamburg, Germany 2009-09-21 |
Document Type: |
Talk (non-conference) |
Research Program: |
Erneuerbare Energien |
Publikationsportal JuSER |
Description not available. |