This title appears in the Scientific Report :
2010
Please use the identifier:
http://dx.doi.org/10.1016/j.jnucmat.2009.11.002 in citations.
Carbon film growth and hydrogenic retention of tungsten exposed to carbon-seeded high density deuterium plasmas
Carbon film growth and hydrogenic retention of tungsten exposed to carbon-seeded high density deuterium plasmas
Tungsten (W) targets have been exposed to high density (n(e) <= 4 x 10(19) m(-3)), low temperature (T-e <= 3 eV) CH4-seeded deuterium (D) plasma in Pilot-PSI. The surface temperature of the target was similar to 1220 K at the center and decreased radially to similar to 650 K at the edges. Carb...
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Personal Name(s): | Wright, G.M. |
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Al, R.S. / Alves, E. / Alves, K.C. / Barradas, N.P. / Kleyn, A.W. / Lopes-Cardozo, N.J. / van der Meiden, H.J. / Philipps, V. / van Rooij, G.J. / Shumack, A.E. / Vijvers, W.A.J. / Westerhout, J. / Zoethout, E. / Rapp, J. | |
Contributing Institute: |
Plasmaphysik; IEK-4 |
Published in: | Journal of nuclear materials, 396 (2010) |
Imprint: |
Amsterdam [u.a.]
Elsevier Science
2010
|
DOI: |
10.1016/j.jnucmat.2009.11.002 |
Document Type: |
Journal Article |
Research Program: |
Fusion |
Series Title: |
Journal of Nuclear Materials
396 |
Subject (ZB): | |
Publikationsportal JuSER |
Tungsten (W) targets have been exposed to high density (n(e) <= 4 x 10(19) m(-3)), low temperature (T-e <= 3 eV) CH4-seeded deuterium (D) plasma in Pilot-PSI. The surface temperature of the target was similar to 1220 K at the center and decreased radially to similar to 650 K at the edges. Carbon film growth was found to only occur in regions where there was a clear CII emission line, corresponding to regions in the plasma with T-e >= 2 eV. The maximum film thickness was similar to 2.1 mu m after a plasma exposure time of 120 S. He-3 nuclear reaction (NRA) analysis and thermal desorption spectroscopy (TDS) determine that the presence of a thin carbon film dominates the hydrogenic retention properties of the W substrate. Thermal desorption spectroscopy analysis shows retention increasing roughly linearly with incident plasma fluence. NRA measures a C/D ratio of similar to 0.002 in these films deposited at high surface temperatures. (C) 2009 Elsevier B.V. All rights reserved. |