This title appears in the Scientific Report :
2010
Etching Titanium Nitride gate stacked on high-k dielectric
Etching Titanium Nitride gate stacked on high-k dielectric
Saved in:
Personal Name(s): | Gerharz, J. |
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Padmaraju, K. / Moers, J. / Grützmacher, D. | |
Contributing Institute: |
Halbleiter-Nanoelektronik; IBN-1 JARA-FIT; JARA-FIT |
Published in: |
Proceedings of the 36th International Conference on Micro & Nano Engineering (MNE), Genoa, Italy from 19 to 22 September 2010 |
Imprint: |
2010
|
Document Type: |
Contribution to a book Contribution to a conference proceedings |
Research Program: |
Grundlagen für zukünftige Informationstechnologien |
Publikationsportal JuSER |
Description not available. |