This title appears in the Scientific Report :
2010
From strained SOI layers to sSi NW: stress and electrical characterization
From strained SOI layers to sSi NW: stress and electrical characterization
Saved in:
Personal Name(s): | Minamisawa, R. A. |
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Habicht, S. / Knoll, L. / Feste, S. F. / Zhao, Q. T. / Kernevez, N. / Bourdelle, K.K. | |
Contributing Institute: |
Halbleiter-Nanoelektronik; IBN-1 JARA-FIT; JARA-FIT |
Published in: |
5th International SiGe Technology and Device Meeting (ISTDm2010) |
Imprint: |
2010
|
Conference: | Stockholm, Schweden 2010-05-24 |
Document Type: |
Talk (non-conference) |
Research Program: |
Grundlagen für zukünftige Informationstechnologien |
Publikationsportal JuSER |
Description not available. |