This title appears in the Scientific Report :
2012
Please use the identifier:
http://dx.doi.org/10.1016/j.tsf.2011.10.190 in citations.
Development of two-step etching approach for aluminium doped zinc oxide using a combination of standard HCl and NH4Cl etch steps
Development of two-step etching approach for aluminium doped zinc oxide using a combination of standard HCl and NH4Cl etch steps
Saved in:
Personal Name(s): | Fernández, S. (Corresponding author) |
---|---|
Pust, Sascha / Hüpkes, J. / Naranjo, F.B. | |
Contributing Institute: |
Photovoltaik; IEK-5 |
Published in: | Thin solid films, 520 (2012) 14, S. 4678 - 4684 |
Imprint: |
Amsterdam [u.a.]
Elsevier
2012
|
DOI: |
10.1016/j.tsf.2011.10.190 |
Document Type: |
Journal Article |
Research Program: |
Thin Film Photovoltaics |
Publikationsportal JuSER |
Description not available. |