Preparation of microcrystalline silicon with the layer-by-layer technique at various plasma excitation frequencies
Preparation of microcrystalline silicon with the layer-by-layer technique at various plasma excitation frequencies
Saved in:
Personal Name(s): | Hapke, P |
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Carius, R / Finger, F / Lambertz, A / Vetterl, O / Wagner, H | |
Contributing Institute: |
Photovoltaik; IEK-5 |
Published in: | MRS online proceedings library |
Imprint: |
Warrendale, Pa.
MRS
1996
|
Physical Description: |
737 - 742 |
Conference: | MRS, San Fran (USA), 2013-04-16 - 2013-11-05 |
Document Type: |
Contribution to a conference proceedings Journal Article |
Research Program: |
Thin Film Photovoltaics |
Publikationsportal JuSER |
Description not available. |