This title appears in the Scientific Report :
2013
Please use the identifier:
http://dx.doi.org/10.1016/j.apsusc.2010.02.057 in citations.
Oxygen influence on sputtered high rate ZnO:Al films from dual rotatable ceramic targets
Oxygen influence on sputtered high rate ZnO:Al films from dual rotatable ceramic targets
Saved in:
Personal Name(s): | Zhu, H. (Corresponding author) |
---|---|
Hüpkes, J. / Bunte, E. / Huang, S. M. | |
Contributing Institute: |
Photovoltaik; IEK-5 |
Published in: | Applied surface science, 256 (2010) 14, S. 4601 - 4605 |
Imprint: |
Amsterdam
North-Holland
2010
|
DOI: |
10.1016/j.apsusc.2010.02.057 |
Document Type: |
Journal Article |
Research Program: |
Thin Film Photovoltaics |
Publikationsportal JuSER |
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