This title appears in the Scientific Report :
2011
Monitoring the growth of microcrystalline silicon deposited by plasma-enhanced chemical vapor deposition using in-situ Raman spectroscopy
Monitoring the growth of microcrystalline silicon deposited by plasma-enhanced chemical vapor deposition using in-situ Raman spectroscopy
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Personal Name(s): | Muthmann, S. |
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Köhler, F. / Meier, M. / Hülsbeck, M. / Carius, R. / Gordijn, A. | |
Contributing Institute: |
Photovoltaik; IEK-5 |
Published in: |
Mat. Res. Soc. Symp. Proc. |
Imprint: |
2011
|
Document Type: |
Contribution to a book Contribution to a conference proceedings |
Research Program: |
Erneuerbare Energien |
Publikationsportal JuSER |
Description not available. |