Full field electron spectromicroscopy applied to ferroelectric materials
Barrett, N. (Corresponding Author)
Rault, J. E. / Wang, J. L. / Mathieu, C. / Locatelli, A. / Mentes, T. O. / Niño, M. A. / Fusil, S. / Bibes, M. / Barthélémy, A. / Sando, D. / Ren, W. / Prosandeev, S. / Bellaiche, L. / Vilquin, B. / Petraru, A. / Krug, Ingo / Schneider, C. M.
Elektronische Eigenschaften; PGI-6
JARA-FIT; JARA-FIT
Journal of applied physics, 113 (2013) 18, S. 187217 -
Melville, NY American Inst. of Physics 2013
10.1063/1.4801968
Journal Article
Peter Grünberg-Centre (PG-C)
OpenAccess
OpenAccess
Please use the identifier: http://dx.doi.org/10.1063/1.4801968 in citations.
Please use the identifier: http://hdl.handle.net/2128/17106 in citations.
The application of PhotoEmission Electron Microscopy (PEEM) and Low Energy Electron Microscopy (LEEM) techniques to the study of the electronic and chemical structures of ferroelectric materials is reviewed. Electron optics in both techniques gives spatial resolution of a few tens of nanometres. PEEM images photoelectrons, whereas LEEM images reflected and elastically backscattered electrons. Both PEEM and LEEM can be used in direct and reciprocal space imaging. Together, they provide access to surface charge, work function, topography, chemical mapping, surface crystallinity, and band structure. Examples of applications for the study of ferroelectric thin films and single crystals are presented.