This title appears in the Scientific Report :
1999
Growth of epitaxial silicides by ion beam synthesis and molecular beam allotaxy and self-assembled pattering of ultrathin CoSi2
Growth of epitaxial silicides by ion beam synthesis and molecular beam allotaxy and self-assembled pattering of ultrathin CoSi2
Saved in:
Personal Name(s): | Mantl, S. |
---|---|
Contributing Institute: |
Institut für Schicht- und Ionentechnik; ISI |
Published in: |
Silicides : fundamentals and applications ; 16th Course of the International School of Solid State Physics |
Imprint: |
1999
|
Conference: | Erice, Italy 1999-06-05 00:00:00 |
Document Type: |
Talk (non-conference) |
Research Program: |
Ionentechnik |
Publikationsportal JuSER |
Description not available. |