This title appears in the Scientific Report :
2004
MOCVD of SrTa2O6 thin films for high-k applications
MOCVD of SrTa2O6 thin films for high-k applications
Saved in:
Personal Name(s): | Regnery, S. |
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Thomas, R. / Haselier, H. / Ehrhart, P. / Waser, R. / Lehnen, P. / Miedl, St. / Schumacher, M. / Szot, K. / Ding, Y. / He, J. / Jia, C. L. | |
Contributing Institute: |
Elektronische Materialien; IFF-IEM Center of Nanoelectronic Systems for Information Technology; CNI Mikrostrukturforschung; IFF-IMF |
Published in: |
MRS Spring Meeting |
Imprint: |
2004
|
Conference: | San Francisco, CA 2004-04-11 |
Document Type: |
Conference Presentation |
Research Program: |
Materialien, Prozesse und Bauelemente für die Mikro- und Nanoelektronik |
Publikationsportal JuSER |
Description not available. |