This title appears in the Scientific Report :
2001
Please use the identifier:
http://dx.doi.org/10.1016/S0955-2219(01)00127-3 in citations.
DC-sputtering of yttria-stabilised zirconia films for solid oxide fuel cell applications
DC-sputtering of yttria-stabilised zirconia films for solid oxide fuel cell applications
Yttria-stabilised zirconia (YSZ) thin films were dc-sputtered and investigated with respect to surface morphology, microstructure and film-substrate interface interaction. The films were deposited under argon/oxygen atmospheres on NiO/YSZ substrates heated to between 500 and 700 degreesC. Dense and...
Saved in:
Personal Name(s): | Hobein, B. |
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Tietz, F. / Stöver, D. / Cekada, M. / Panjan, L. M. | |
Contributing Institute: |
Werkstoffsynthese und Herstellungsverfahren; IWV-1 |
Published in: | Journal of the European Ceramic Society, 21 (2001) S. 1843 - 1846 |
Imprint: |
Amsterdam [u.a.]
Elsevier Science
2001
|
Physical Description: |
1843 - 1846 |
DOI: |
10.1016/S0955-2219(01)00127-3 |
Document Type: |
Journal Article |
Research Program: |
Solid Oxide Fuel Cell Werkstoff- und Bauteilentwicklung für die Hochtemperatur-Brennstoffzelle |
Series Title: |
Journal of the European Ceramic Society
21 |
Subject (ZB): | |
Publikationsportal JuSER |
Yttria-stabilised zirconia (YSZ) thin films were dc-sputtered and investigated with respect to surface morphology, microstructure and film-substrate interface interaction. The films were deposited under argon/oxygen atmospheres on NiO/YSZ substrates heated to between 500 and 700 degreesC. Dense and crack-free coatings were obtained in the thickness range of 1 to 10 mum. The film morphology varied from columnar to crystalline structure depending on the oxygen pressure and the substrate temperature. Whereas the coated films consisted of YSZ with cubic and tetragonal crystal structure under low oxygen atmospheres, the same deposition experiments on Al2O3 substrates revealed highly disordered layers of cubic YSZ. The formation of oxide layers on the NiO/YSZ substrates is due to a film-substrate redox interaction. The NO grains close to the coating interface are partially reduced and serve as an oxygen source for the oxidation of the film. An exponential decay of the gas leakage vs. coating thickness was found. (C) 2001 Elsevier Science Ltd. All rights reserved. |