Skip to content
VuFind
  • 0 Items in e-Shelf (Full)
  • History
  • User Account
  • Logout
  • User Account
  • Help
    • English
    • Deutsch
  • Books & more
  • Articles & more
  • JuSER
Advanced
 
  • Literature Request
  • Cite this
  • Email this
  • Export
    • Export to RefWorks
    • Export to EndNoteWeb
    • Export to EndNote
    • Export to MARC
    • Export to MARCXML
    • Export to BibTeX
  • Favorites
  • Add to e-Shelf Remove from e-Shelf


QR Code
This title appears in the Scientific Report : 2009 

Microcrystalline silicon carbide alloys prepared with HWCVD as highly transparent and conductive window layers for thin film solar cells

Microcrystalline silicon carbide alloys prepared with HWCVD as highly transparent and conductive window layers for thin film solar cells

Crystalline silicon carbide alloys have a very high potential as transparent conductive window layers in thin-film solar cells provided they can be prepared in thin-film form and at compatible deposition temperatures. The low-temperature deposition of such material in microcrystalline form (mu c-Si:...

More

Saved in:
Personal Name(s): Finger, F.
Astakhov, O. / Bronger, T. / Carius, R. / Chen, T. / Dasgupta, A. / Gordijn, A. / Houben, L. / Huang, Y. / Klein, S. / Luysberg, M. / Wang, H. / Xiao, L.
Contributing Institute: Mikrostrukturforschung; IFF-8
JARA-ENERGY; JARA-ENERGY
Photovoltaik; IEF-5
Published in: Thin solid films, 517 (2009) S. 3507 - 3512
Imprint: Amsterdam [u.a.] Elsevier 2009
Physical Description: 3507 - 3512
DOI: 10.1016/j.tsf.2009.01.115
Document Type: Journal Article
Research Program: Grundlagen für zukünftige Informationstechnologien
Erneuerbare Energien
Series Title: Thin Solid Films 517
Subject (ZB):
J
Catalytic CVD
Hot-wire CVD
Sic alloys
Thin film solar cells
Publikationsportal JuSER
Please use the identifier: http://dx.doi.org/10.1016/j.tsf.2009.01.115 in citations.

  • Description
  • Staff View

Crystalline silicon carbide alloys have a very high potential as transparent conductive window layers in thin-film solar cells provided they can be prepared in thin-film form and at compatible deposition temperatures. The low-temperature deposition of such material in microcrystalline form (mu c-Si:C:H) was realized by use of monomethylsilane precursor gas diluted in hydrogen with the Hot-Wire Chemical Vapor Deposition process. A wide range of deposition parameters has been investigated and the structural, electronic and optical properties of the mu c-SiC:H thin films have been studied. The material, which is strongly n-type from unintentional doping, has been used as window layer in n-side illuminated microcrystalline silicon solar cells. High short-circuit current densities are obtained due to the high transparency of the material resulting in a maximum solar cell conversion efficiency of 9.2%. (C) 2009 Elsevier B.V. All rights reserved.

  • Forschungszentrum Jülich
  • Central Library (ZB)
  • Powered by VuFind 6.1.1
Loading...