This title appears in the Scientific Report :
2009
Amorphous ternary rare-earth gate oxides for future integration in MOSFETs
Amorphous ternary rare-earth gate oxides for future integration in MOSFETs
| Personal Name(s): | Roeckerath, M. |
|---|---|
| Lopes, J. M. J. / Durgun Özben, E. / Littmark, U. / Luptak, R. / Lenk, S. / Luysberg, M. / Besmehn, A. / Breuer, U. / Schubert, J. / Mantl, S. | |
| Contributing Institute: |
Halbleiter-Nanoelektronik; IBN-1 JARA-FIT; JARA-FIT Zentralabteilung für Chemische Analysen; ZCH Mikrostrukturforschung; IFF-8 |
| Published in: |
ULIS 2009 |
| Imprint: |
2009
|
| Conference: | Aachen 2009-03-18 |
| Document Type: |
Talk (non-conference) |
| Research Program: |
Grundlagen für zukünftige Informationstechnologien |
| Publikationsportal JuSER |
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| 245 | |a Amorphous ternary rare-earth gate oxides for future integration in MOSFETs | ||
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