This title appears in the Scientific Report :
2005
Please use the identifier:
http://dx.doi.org/10.1016/j.electacta.2005.04.065 in citations.
Towards self-aligned nanostructures by means of layer-expansion technique
Towards self-aligned nanostructures by means of layer-expansion technique
A new and simple nanostructuring method that combines the conventional photolithography and layer expansion or pattern-size reduction technique is presented. The method is based on a complete conversion of a photolithographically patterned metal layer to a metal-oxide mask with improved pattern-size...
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Personal Name(s): | Poghossian, A. |
---|---|
Platen, J. / Schöning, M.-J. | |
Contributing Institute: |
Center of Nanoelectronic Systems for Information Technology; CNI Institut für Bio- und Chemosensoren; ISG-2 |
Published in: | Electrochimica acta, 51 (2005) S. 838 - 843 |
Imprint: |
New York, NY [u.a.]
Elsevier
2005
|
Physical Description: |
838 - 843 |
DOI: |
10.1016/j.electacta.2005.04.065 |
Document Type: |
Journal Article |
Research Program: |
Materialien, Prozesse und Bauelemente für die Mikro- und Nanoelektronik |
Series Title: |
Electrochimica Acta
51 |
Subject (ZB): | |
Publikationsportal JuSER |
A new and simple nanostructuring method that combines the conventional photolithography and layer expansion or pattern-size reduction technique is presented. The method is based on a complete conversion of a photolithographically patterned metal layer to a metal-oxide mask with improved pattern-size resolution using the thermal oxidation process. The mask can be further applied for the fabrication of different nanostructures and nano-devices. (C) 2005 Elsevier Ltd. All rights reserved. |