This title appears in the Scientific Report :
2007
Please use the identifier:
http://dx.doi.org/10.1016/j.matlet.2006.04.003 in citations.
Plasma assisted chemical vapour deposition of Cr coatings using chromium (III) acetylacetonate vapour source
Plasma assisted chemical vapour deposition of Cr coatings using chromium (III) acetylacetonate vapour source
We report here the synthesis and characterisation of Cr coatings by an environmental friendly Plasma Assisted Metal-Organic Chemical Vapour Deposition (PAMOCVD) process. The Cr coatings were developed using Cr(acaC)3 as the chemical vapour source at a substrate temperature and a power density of 550...
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Personal Name(s): | Premkumar, P. A. |
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Kuppusami, P. / Dasgupta, A. / Mallika, C. / Nagaraja, K. S. / Raghunathan, V. S. | |
Contributing Institute: |
Photovoltaik; IEF-5 |
Published in: | Materials letters, 61 (2007) S. 50 - 53 |
Imprint: |
New York, NY [u.a.]
Elsevier
2007
|
Physical Description: |
50 - 53 |
DOI: |
10.1016/j.matlet.2006.04.003 |
Document Type: |
Journal Article |
Research Program: |
Erneuerbare Energien |
Series Title: |
Materials Letters
61 |
Subject (ZB): | |
Publikationsportal JuSER |
We report here the synthesis and characterisation of Cr coatings by an environmental friendly Plasma Assisted Metal-Organic Chemical Vapour Deposition (PAMOCVD) process. The Cr coatings were developed using Cr(acaC)3 as the chemical vapour source at a substrate temperature and a power density of 550 degrees C and 70 mW/cm(2), respectively. The films were characterized using X-ray diffraction, scanning electron microscopy, X-ray photoelectron spectroscopy and Vicker's microhardness measurements. The investigations revealed that the Cr films are nanocrystalline, free from pores and cracks and have hardness of 1200 HV The energy dispersive analysis of X-rays and XPS confirmed the presence of Cr in the films. (c) 2006 Elsevier B.V. All rights reserved. |