Dasgupta, A., Huang, Y., Houben, L., Klein, S., Finger, F., Carius, R., & Luysberg, M. (2008). Effect of filament and substrate temperatures on the structural and electrical properties of SIC thin films grown by the HWCVD technique. Amsterdam [u.a.]: Elsevier.
Chicago Style CitationDasgupta, A., Y. Huang, L. Houben, S. Klein, F. Finger, R. Carius, andfavorite M. Luysberg. Effect of Filament and Substrate Temperatures On the Structural and Electrical Properties of SIC Thin Films Grown By the HWCVD Technique. Amsterdam [u.a.]: Elsevier, 2008.
MLA CitationDasgupta, A., et al. Effect of Filament and Substrate Temperatures On the Structural and Electrical Properties of SIC Thin Films Grown By the HWCVD Technique. Amsterdam [u.a.]: Elsevier, 2008.