This title appears in the Scientific Report : 2007 

Interface magnetization of ultrathin epitaxial Co2FeSi(110)/Al2O3 films
Kallmayer, M.
Schneider, H. / Jakob, G. / Elmers, H. J. / Balke, B. / Cramm, S.
Institut für Festkörperforschung; IFF
Journal of physics / D, 40 (2007) S. 1552 - 1557
Bristol IOP Publ. 2007
1552 - 1557
10.1088/0022-3727/40/6/S07
Journal Article
Kondensierte Materie
Journal of Physics D - Applied Physics 40
J
Please use the identifier: http://dx.doi.org/10.1088/0022-3727/40/6/S07 in citations.
Element-specific magnetic properties of ultrathin epitaxial Co2FeSi( 110) films were measured using x-ray magnetic circular dichroism ( XMCD). The epitaxial Heusler films were grown by RF magnetron sputtering on Al2O3( 1120) substrates. The magnetization of thicker films as determined by XMCD is smaller than expected for a half-metallic material. In addition, the magnetization decreases considerably for films thinner than 10 nm. The thickness dependence of the magnetic moment can be described by introducing a certain number of dead layers representing a deficiency of magnetization at the interfaces. Quantitative evaluation results in a dead layer thickness of 0.8 nm at room temperature, consisting of a temperature induced size effect of 0.1 nm and a surface effect of 0.15 nm at the top and 0.55 nm at the bottom interface.