This title appears in the Scientific Report :
2009
Strontium ruthenate (SRO) - strontium titanate (STO) thin film capacitor by RF sputtering for DRAM application
Strontium ruthenate (SRO) - strontium titanate (STO) thin film capacitor by RF sputtering for DRAM application
Saved in:
Personal Name(s): | Schmelzer, S. |
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Bräuhaus, D. / Böttger, U. / Hoffmann-Eifert, S. / Meuffels, P. / Reinig, P. / Schroeder, H. / Waser, R. | |
Contributing Institute: |
Elektronische Materialien; IFF-6 JARA-FIT; JARA-FIT |
Published in: |
International Symposium on Integrated Ferroelectrics and Functionalities (ISIF^2) |
Imprint: |
2009
|
Conference: | Colorado Springs, USA 2009-09-27 |
Document Type: |
Conference Presentation |
Research Program: |
Grundlagen für zukünftige Informationstechnologien |
Publikationsportal JuSER |
Description not available. |