This title appears in the Scientific Report :
2016
Sputtering sources for high-pressure sputtering with large targets and sputtering method
Sputtering sources for high-pressure sputtering with large targets and sputtering method
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Personal Name(s): | Faley, Michael (Corresponding author) |
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Contributing Institute: |
Mikrostrukturforschung; PGI-5 |
Imprint: |
2016
|
Document Type: |
Patent |
Research Program: |
Controlling Collective States |
Publikationsportal JuSER |
Description not available. |