This title appears in the Scientific Report :
2019
Please use the identifier:
http://dx.doi.org/10.1016/j.nme.2018.12.008 in citations.
Please use the identifier: http://hdl.handle.net/2128/21166 in citations.
Influence of heavier impurity deposition on surface morphology development and sputtering behavior explored in multiple linear plasma devices
Influence of heavier impurity deposition on surface morphology development and sputtering behavior explored in multiple linear plasma devices
Surface morphology development and sputtering behavior of Cr, as a test material, have been explored under He plasma exposure at a low incident ion energy of ∼80 eV in multiple linear plasma devices: PISCES-A, PSI-2, and NAGDIS-II. From comparison of the experiments in these devices, deposition of a...
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Personal Name(s): | Nishijima, D. (Corresponding author) |
---|---|
Kreter, A. / Baldwin, M. J. / Borodin, D. / Eksaeva, A. / Hwangbo, D. / Kajita, S. / Miyamoto, M. / Ohno, N. / Patino, M. / Pospieszczyk, A. / Rasinski, M. / Schlummer, T. / Terra, A. / Doerner, R. P. | |
Contributing Institute: |
Plasmaphysik; IEK-4 |
Published in: | Nuclear materials and energy, 18 (2019) S. 67 - 71 |
Imprint: |
Amsterdam [u.a.]
Elsevier
2019
|
DOI: |
10.1016/j.nme.2018.12.008 |
Document Type: |
Journal Article |
Research Program: |
Methods and Concepts for Material Development |
Link: |
OpenAccess OpenAccess |
Publikationsportal JuSER |
Please use the identifier: http://hdl.handle.net/2128/21166 in citations.
Surface morphology development and sputtering behavior of Cr, as a test material, have been explored under He plasma exposure at a low incident ion energy of ∼80 eV in multiple linear plasma devices: PISCES-A, PSI-2, and NAGDIS-II. From comparison of the experiments in these devices, deposition of a small amount of heavier impurities (Mo in NAGDIS-II and Ta in PISCES-A) onto Cr is found to result in the formation of cone structures on the Cr surface due to preferential sputtering, resulting in a significant reduction (up to ∼10 times) in the sputtering yield of Cr due to line-of-sight redeposition onto the neighboring cones. The heavier impurities are thought to originate from a sample holding cap/cover, which can be sputtered by a trace amount of intrinsic impurities (C, O, etc) as well as by Cr ionized in the plasma. It can be concluded from the Cr experiments, as well as additional Be data collected in PISCES-B, that heavier impurity deposition plays a major role in the cone structure formation, while other mechanisms (e.g. surface irregularity and oxide) also exist. |