Plasmagestützte Abscheidung und Charakterisierung von dünnen mehrphasigen Schichten
Nöthe, Michael (Corresponding author)
Publikationen vor 2000; PRE-2000; Retrocat
Jülich Forschungszentrum Jülich GmbH Zentralbibliothek, Verlag 2000
VI, 143 p.
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Berichte des Forschungszentrums Jülich 3789
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OpenAccess
Please use the identifier: http://hdl.handle.net/2128/24015 in citations.


The adhesion of wear resistant coatings with predominant covalent bond content is limited byhigh stresses of the layers and by the weak chemial interaction between the metallic substrateand the covalent top layer. One essential aim of this work was the investigation of the structure and properties of a-C:H layers on several interlayer materials (Al, Ti, Cr,Cu). Thelayer deposition was carried out by plasmabased processes. The interlayer was deposited byevaporation of the metal and a-C:H by introduction of acetylene into dense plasma.Additionally Si containing interlayers were formed by PACVD deposition. The second aim ofthis work was the deposition of a-SiC$_{x}$O$_{y}$:H, a-SiC$_{x}$:H, a-SiC$_{x}$O$_{y}$N$_{z}$:H and a-SiC$_{x}$N$_{y}$:H layersby PACVD. The Precursor materials were TEOS (Tetraethoxysilane) and TMS(Tetramethylsilane). The deposited layer is essentially ruled by the process in plasma. So the ion population in plasmas with added TEOS was analyzed by mass spectroscopy.The best adhesion of a-C:H top layers followed from the application of Al interlayers with aextensive graded transition between the layers. On Cr and Si containing layers animprovement of the adhesion could be achieved compared to the layers without interlayer. Tiis a poorly suitable interlayer material. On Cu no adhering layers could be formed. Theinvestigations of layer structure and compositon were made with TEM, SEM, SIMS, SNMS.The analyses of plasmas with added TEOS showed, that the composition of the backgroundgas has minor influence on the fragmentation of the TEOS molecules. The degree offragmentation rises with electron temperature, which rises with magnetic field. The enhancedfragmentation in presence of magnetic fields leads to the enhanced formation of CH$_{x}$ andC$_{2}$H$_{x}$ molekules and radicals in plasma. Most of this carbon spezies have a especially highsteking coefficient on the growing surface. So layers deposited in presence of magnetic fieldshave a significantly enhanced carbon content.