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Advances in applied mechanics. 40 /
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Transporteigenschaften dünner LaTiO3+x-Schichten und Heterostrukturen /
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Handbook of thin film deposition processes and techniques : principles, methods, equipment and applications /
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Innovative processing of films and nanocrystalline powders /
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Low temperature plasma physics : fundamental aspects and applications /
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Physical vapor deposition of thin films /
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Handbook of advanced plasma processing techniques /
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Organometallic vapor phase epitaxy : theory and practice /
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Handbook of chemical vapor deposition (CVD) : principles, technology, and applications /
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Growth processes and surface phase equilibria in molecular beam epitaxy /
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Mechanisms and principles of epitaxial growth in metallic systems : symposium held April 13-14, 1998, San Francisco, California, USA [at the 1998 MRS spring meeting] /
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Morphological organizations in epitaxial growth and removal /
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Materials science in microelectronics. 2. The effects of structure on properties in thin films /
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CVD of compound semiconductors : precursor synthesis, development and applications /
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CVD of nonmetals.
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Molecular beam epitaxy : fundamentals and current status /
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Materials science in microelectronics. 1. The relationships between thin film processing and structure /
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Science and technology of thin films.
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Vakuumbeschichtung Vol 0001: Plasmaphysik, Plasmadiagnostik, Analytik.
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Frey, H.
1995
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Vakuumbeschichtung Vol 0002: Verfahren und Anlagen.
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Kienel, G.
1995
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