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FFPE - Thin film electronic properties, semiconductor interfaces
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FFPE - Thin film electronic properties, semiconductor interfaces
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1
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Selective low pressure chemical vapor deposition of tasi2 on silicon.
Wendling, T. P.
1991
“
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FGKF
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Chemical
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deposition
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Einfluss von Grenzflächenrauhigkeit, Ordnungseffekten und Dotierungen auf die optischen Eigenschaften von INP- basierten MOCVD- Heterostrukturen.
Oertel, D.
1987
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FGKF
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Chemical
vapor
deposition
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Name
Oertel, D.
1
Wendling, T. P.
1
Subject
chemical vapor deposition
2
interface phenomena
1
optical properties
1
order parameter
1
semiconductor heterostructure
1
Classification
FFPE - Thin film electronic properties, semiconductor interfaces
FGKF - Chemical vapor deposition
2
FFME - Surface forces, adhesion, thin film mechanical properties
1
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