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optical properties
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1
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Diamond for electronic applications: symposium: proceedings : Boston, MA, 27.11.95-01.12.95.
Dreifus, D. L.
1996
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FGKF
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Chemical
vapor
deposition
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2
Book
Einfluss von Grenzflächenrauhigkeit, Ordnungseffekten und Dotierungen auf die optischen Eigenschaften von INP- basierten MOCVD- Heterostrukturen.
Oertel, D.
1987
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Chemical
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deposition
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Dreifus, D. L.
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Oertel, D.
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chemical vapor deposition
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optical properties
diamond film
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epitaxy
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order parameter
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FGKF - Chemical vapor deposition
2
FFME - Surface forces, adhesion, thin film mechanical properties
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FFPE - Thin film electronic properties, semiconductor interfaces
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FNX - Carbon, carbon materials
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