1
Halbleiterätzverfahren: Kinetik, Verfahrensgrundlagen und Anwendungsgebiete von nasschemischen Ätzverfahren für Silizium, Galliumarsenid, Galliumphosphid und Indiumphosphid.
Book
Loewe, H.
1990
“...FGKJ - Plasma processing, etching...”
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2
Ipat 1981 : Ion and plasma assisted techniques: international conference 3 : Amsterdam, 30.06.81-02.07.81.
Book
1981
“...FGKJ - Plasma processing, etching...”
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3
Preparation and characterization : Film preparation and etching by plasma technology : international seminar : Brighton, 25.03.81-27.03.81.
Book
1981
“...FGKJ - Plasma processing, etching...”
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