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FGKJ - Plasma processing, etching
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FGKJ - Plasma processing, etching
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Plasma processing for VLSI.
Einspruch, N. G.
1984
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Mikroelektronik
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Atomic layer processing : semiconductor dry etching technology /
Lill, Thorsten
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ZB
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IBN-1-2
1
Name
Einspruch, N. G.
1
Lill, Thorsten
1
Subject
Nanostructured material
1
etching
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plasma physics
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semiconductor
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FGKJ - Plasma processing, etching
FGM - Microelectronic technology
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English
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