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Stress induced phenomena in metallization : 5th International Workshop [on Stress Induced Phenomena in Metallization] : Stuttgart, Germany, June 1999 /
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International Electron Devices Meeting. 1999 : IEDM : technical digest : Washington, DC, December 5-8, 1999 /
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Techniques and industrial applications /
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Indo-German Workshop on Microelectronics. 2 : Suraj Kund, New Delhi, December, 7th - 8th, 1995 [E-Book] /
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Ultraclean surface processing of silicon wafers : secrets of VLSI manufacturing /
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Mikroelektronik. 2. Herstellungsprozesse für integrierte Schaltungen /
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Fundamental electrochemistry and physics /
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Handbook of semiconductor interconnection technology /
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Indo-German Workshop on Microelectronics. 2 : Suraj Kund, New Delhi, December, 7th - 8th, 1995 /
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Semiconductor material and device characterization /
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Defect recognition and image processing in semicondoctors 1997 : proceedings of the Seventh International Conference on Defect Recognition and Image Processing in Semiconductors : (DRIP VII) : held in Templin, Germany, 7 - 10 September 1997 /
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International Electron Devices Meeting. 1998 : IEDM : technical digest : San Francisco, CA, December 6-9, 1998.
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Characterization and metrology for ULSI technology : 1998 international conference Gaithersburg, Maryland [23. - 27.] March 1998 : [the 1998 International Conference on Characterization and Metrology for ULSI Technology] /
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Mikroelektronik. 1. Prinzipien, Bauelemente und Werkstoffe der Siliziumtechnologie /
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Handbook of microlithography, micromachining, and microfabrication. 1. Microlithography /
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Technologie der III/V-Halbleiter : III/V-Heterostrukturen und elektronische Höchstfrequenz-Bauelemente /
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Chemical mechanical planarization of microelectronic materials /
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International Electron Devices Meeting. 1997 : Washington, DC, December 7-10, 1997 : EDM technical digest.
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Handbook of microlithography, micromachining, and microfabrication. 2. Micromachining and microfabrication /
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Advances in rapid thermal and integrated processing : NATO advanced study institute on advances in rapid thermal and integrated processing: proceedings : Acquafredda-di-Maratea, 03.07.95-14.07.95.
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