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FGKJ - Plasma processing, etching
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FGKJ - Plasma processing, etching
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1
E-Book
Plasmaabscheidung von mikrokristallinem Silizium : Merkmale und Mikrostruktur und deren Deutung im Sinne von Wachstumsvorgängen [E-Book] /
Houben, Lothar
2000
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FJKB
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Elemental
semiconductors
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Book
Halbleiterätzverfahren: Kinetik, Verfahrensgrundlagen und Anwendungsgebiete von nasschemischen Ätzverfahren für Silizium, Galliumarsenid, Galliumphosphid und Indiumphosphid.
Loewe, H.
1990
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FJKB
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Elemental
semiconductors
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3
Book
Silicon: chemical etching.
Grabmaier, J.
1982
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FJKB
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Elemental
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Available as
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2
Electronic Edition
1
Material Type
Book
3
Type of Literature
Theses
1
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Location
ZB
2
IFF
1
Name
Grabmaier, J.
1
Heimann, R. B.
1
Houben, Lothar
1
Keppel, P.
1
Loewe, H.
1
Moritz, C.
1
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Zach, D.
1
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Subject
etching
2
silicon
2
III - V semiconductor
1
microstructure analysis
1
semiconductor processing
1
Classification
FGKJ - Plasma processing, etching
FJKB - Elemental semiconductors
3
FGCD - Crystal growth of specific substances
1
FHAB - Surface and thin film characterization
1
FJKC - III - V semiconductors
1
Language
German
1
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